• 文献标题:   The role of copper pretreatment on the morphology of graphene grown by chemical vapor deposition
  • 文献类型:   Article
  • 作  者:   GNANAPRAKASA TJ, GU YX, EDDY SK, HAN ZX, BECK WJ, MURALIDHARAN K, RAGHAVAN S
  • 作者关键词:   graphene, cvd, copper pretreatment, electropolishing, corrosion inhibitor
  • 出版物名称:   MICROELECTRONIC ENGINEERING
  • ISSN:   0167-9317 EI 1873-5568
  • 通讯作者地址:   Univ Arizona
  • 被引频次:   9
  • DOI:   10.1016/j.mee.2014.10.021
  • 出版年:   2015

▎ 摘  要

The effect of pretreatment of copper on the ensuing morphology and surface coverage of graphene grown using chemical vapor deposition (CVD) has been investigated. Specifically, graphene grown on electropolished copper (EP-Cu) was analyzed with respect to its surface morphology, surface roughness and thickness, and compared with graphene grown on as cold-rolled acetic acid cleaned copper (AA-Cu). Results show an improvement in the quality of graphene obtained using EP-Cu over AA-Cu. Additionally, electrochemical polarization studies were performed on annealed and graphene coated EP-Cu in acidic solutions. The results indicate that corrosion inhibition of EP-Cu is possible through the use of graphene films. (C) 2014 Elsevier B.V. All rights reserved.