▎ 摘　　要

Graphene-based nanostructures are considered as promising alternatives to silicon-based mesostructures in future electronic nanodevices. The lithographical patterning of graphene, which are essential steps in any form of microelectronic processing, present interesting challenges because of the atomic layer thickness of graphene. Mesoscopic devices based on graphene require high spatial resolution patterning that will induce as little damage as possible. This research news highlights and evaluates recent developments in the nanostructuring and patterning of graphene.