• 文献标题:   Monolayer Selective Methylation of Epitaxial Graphene on SiC(0001) through Two-Step Chlorination-Alkylation Reactions
  • 文献类型:   Article
  • 作  者:   HOSSAIN MZ, RAZAK MBA, NORITAKE H, SHIOZAWA Y, YOSHIMOTO S, MUKAI K, KOITAYA T, YOSHINOBU J, HOSAKA S
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF PHYSICAL CHEMISTRY C
  • ISSN:   1932-7447
  • 通讯作者地址:   Gunma Univ
  • 被引频次:   11
  • DOI:   10.1021/jp5068186
  • 出版年:   2014

▎ 摘  要

One of the real challenges in realization of many of graphene's anticipated applications is the development of a common chemical route for modifying graphene with varieties of functionalities. Here, we successfully demonstrate the organic modification of epitaxial graphene (EG) grown on the Si-face of SiC substrate through two-step chlorination-alkylation reactions. Pristine and chemically modified graphene are characterized by scanning tunneling microscope and spectroscopy, X-ray photoelectron spectroscopy, and Raman measurements. The first-step photochlorination is found to occur very selectively on the monolayer graphene region leaving the bi- and trilayer graphene regions clean. Consequently, the CH3-functionalized graphene is observed only in the monolayer graphene regions after the chlorinated EG was treated with CH3MgBr in air-free condition. Both Cl and CH3 are observed to be chemically bonded to the basal plane of the graphene. The CH3-functionalized graphene is thermally more stable than that of the chlorinated graphene. The present two-step chlorination methylation procedure is expected to open a new route for organic modification of graphene with different functional groups using a variety of Grignard reagents.