• 文献标题:   Graphene-like film CVD on e-beam exposed SiO2/Si by the pyrolysis of different oxygen-containing precursors
  • 文献类型:   Article
  • 作  者:   SEDLOVETS DM, KNYAZEV MA, TROFIMOV OV, KOVESHNIKOV SV
  • 作者关键词:   electron beam, electron exposure, cvd, graphenelike film
  • 出版物名称:   FULLERENES NANOTUBES CARBON NANOSTRUCTURES
  • ISSN:   1536-383X EI 1536-4046
  • 通讯作者地址:   RAS
  • 被引频次:   0
  • DOI:   10.1080/1536383X.2019.1708731 EA JAN 2020
  • 出版年:   2020

▎ 摘  要

ABSRTACT We have previously found that pyrolysis of ethanol vapor on charge pre-patterned SiO2/Si substrate leads to controllable deposition of graphene-like films (GLFs). In this work we aim at the GLFs synthesis from acetone and isopropanol on SiO2/Si exposed to an electron beam with various energies and doses. Electron beam induced charge in 200 nm SiO2 is determined by the shift of the capacitance-voltage characteristics. Synthesized GLFs are characterized using Raman spectroscopy and atomic force microscopy. It is shown that the thickness of GLF on SiO2/Si increase together with the preliminary exposure dose and inversely associated with electron energies.