• 文献标题:   High-quality, single-layered epitaxial graphene fabricated on 6H-SiC (0001) by flash annealing in Pb atmosphere and mechanism
  • 文献类型:   Article
  • 作  者:   HU TW, LIU XT, MA F, MA DY, XU KW, CHU PK
  • 作者关键词:   flash annealing, epitaxial graphene, pb atmosphere
  • 出版物名称:   NANOTECHNOLOGY
  • ISSN:   0957-4484 EI 1361-6528
  • 通讯作者地址:   City Univ Hong Kong
  • 被引频次:   10
  • DOI:   10.1088/0957-4484/26/10/105708
  • 出版年:   2015

▎ 摘  要

High-quality epitaxial graphene is produced on silicon carbide by flash annealing of 6H-SiC in a lead (Pb) atmosphere at similar to 1400 degrees C for 30 s. Nearly three top bilayers of SiC are decomposed due to fast heating and cooling, and sublimation of Si atoms from SiC is retarded by the Pb atmosphere. The synergetic effects promote the growth of continuous single-layered graphene sheets on the SiC terraces, and a model is established to elucidate the effects and growth mechanism.