• 文献标题:   Low temperature deposited graphene by surface wave plasma CVD as effective oxidation resistive barrier
  • 文献类型:   Article
  • 作  者:   KALITA G, AYHAN ME, SHARMA S, SHINDE SM, GHIMIRE D, WAKITA K, UMENO M, TANEMURA M
  • 作者关键词:   oxidation, copper, passive film, raman spectroscopy
  • 出版物名称:   CORROSION SCIENCE
  • ISSN:   0010-938X EI 1879-0496
  • 通讯作者地址:   Nagoya Inst Technol
  • 被引频次:   35
  • DOI:   10.1016/j.corsci.2013.09.013
  • 出版年:   2014

▎ 摘  要

An effective approach for preserving the metal surface from oxidation and corrosion is of a great importance for various practical and industrial applications. Here, we demonstrate that graphene coating by surface wave plasma (SWP) chemical vapor deposition (CVD) technique at low temperature (similar to 450 degrees C) is promising as an oxidation resistive barrier of Cu foil. A strong oxidation resistance performance is obtained for the Cu foil heated in atmospheric conditions with robust surface passivation by the deposited graphene film. The developed process can be exploited for various types of metals as graphene growth is independent of catalytic ability of the metal surface and scalable by a roll-to-roll deposition process. (C) 2013 Elsevier Ltd. All rights reserved.