• 文献标题:   Hydride vapor phase epitaxy of GaN on self-organized patterned graphene masks
  • 文献类型:   Article
  • 作  者:   ZHAO ZD, WANG B, XU W, ZHANG HR, CHEN ZY, YU GH
  • 作者关键词:   semiconductor, crystal growth, gan, hydride vapor phase epitaxy, graphene mask
  • 出版物名称:   MATERIALS LETTERS
  • ISSN:   0167-577X EI 1873-4979
  • 通讯作者地址:   Chinese Acad Sci
  • 被引频次:   9
  • DOI:   10.1016/j.matlet.2015.04.042
  • 出版年:   2015

▎ 摘  要

Self-organized patterned graphene masks were produced from graphene decomposition to realize epitaxial lateral overgrowth on a metal organic chemical vapor deposition-GaN/sapphire substrate. Graphene was decomposed with hydrogen and liquid gallium assistance. Graphene completely decomposed without ammonia protection. Liquid gallium was produced from GaN decomposition, which was suppressed by ammonia. Dot- or hexagonal-patterned graphene masks were obtained under optimized decomposition conditions. Thermal stress was greater than the bonding energy of van der Waals force between GaN and graphene; thus, GaN template separated from sapphire during cooling down after hydride vapor phase epitaxy lateral overgrowth. (C) 2015 Elsevier B.V. All rights reserved.