• 文献标题:   Graphene-assisted low temperature growth of nearly single-crystalline GaN thin films via plasma-enhanced atomic layer deposition
  • 文献类型:   Article
  • 作  者:   HE YF, SONG YM, WEI HY, QIU P, LIU H, ZHU XL, TIAN F, PENG MZ, ZHENG XH
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:  
  • 被引频次:   1
  • DOI:   10.1063/5.0128372
  • 出版年:   2023

▎ 摘  要

Direct growth of gallium nitride (GaN) thin films is performed using plasma-enhanced atomic layer deposition (PEALD) at 300 ? on a sapphire with a graphene interlayer. The x-ray diffraction and spherical aberration corrected transmission microscope results confirm that the GaN thin films are nearly single-crystalline. Additionally, the interfacial properties and nucleation behaviors of the GaN thin films deposited on graphene are investigated in detail. Therefore, this study offers a perspective on PEALD growth of high-quality nanoscale GaN epilayers and broadens the choice for low-temperature fabrication of GaN based-devices.