• 文献标题:   Optimization of graphene-MoS2 barristor by 3-aminopropyltriethoxysilane (APTES)
  • 文献类型:   Article
  • 作  者:   SHIM J, PARK JH
  • 作者关键词:   graphene, mos2, barristor, charge puddle effect, 3aminopropyltriethoxysilane
  • 出版物名称:   ORGANIC ELECTRONICS
  • ISSN:   1566-1199 EI 1878-5530
  • 通讯作者地址:   Sungkyunkwan Univ
  • 被引频次:   9
  • DOI:   10.1016/j.orgel.2016.03.019
  • 出版年:   2016

▎ 摘  要

We theoretically and experimentally investigated the influence of the Fermi level position of graphene relative to the Dirac point on the performance of a graphene/MoS2 heterojunction barristor. A large Fermi level modulation (Delta E-F = 0.28 eV) of graphene, when the V-GS is changed between -20 V and +20 V, was theoretically predicted when the Fermi level is located at the Dirac point. For reference, Delta E-F = 0.11 eV when the Fermi level is far from the Dirac point. This prediction was experimentally proven using two kinds of barristors with pristine (strongly p-type) and 2.4% APTES-treated (intrinsic) graphene. The on/off-current ratio was improved by a factor of 32 (a 2.1-fold increase in the on-current density and a 15-fold increase in the off-current density) in the APTES-treated device, as compared to the control. Using a temperature-dependent current-voltage measurement, we quantitatively confirmed the larger modulation of the barrier height in the APTES-treated barristor (Delta E-F = 0.27 eV) compared to that of the control device (Delta E-F = 0.14 eV). This study can be used to guide the design and optimization of graphene-based heterojunction devices. (C) 2016 Elsevier B.V. All rights reserved.