• 文献标题:   Synthesis, structural and field emission properties of multiwall carbon nanotube-graphene-like nanocarbon hybrid films grown by microwave plasma enhanced chemical vapor deposition
  • 文献类型:   Article
  • 作  者:   CHOCKALINGAM S, BISHT A, PANWAR OS, KESARWANI AK, SINGH BP, CHAND J, SINGH VN
  • 作者关键词:   thin film, chemical vapor deposition cvd, raman spectroscopy scattering, electron microscopy, field emission, nanostructure
  • 出版物名称:   MATERIALS CHEMISTRY PHYSICS
  • ISSN:   0254-0584 EI 1879-3312
  • 通讯作者地址:   CSIR
  • 被引频次:   12
  • DOI:   10.1016/j.matchemphys.2015.02.016
  • 出版年:   2015

▎ 摘  要

Multiwall carbon nanotube (MWCNT)-graphene-like nanocarbon hybrid films were directly deposited on nickel substrate without any pre-treatment in a single-step by microwave plasma enhanced chemical vapor deposition (MW PECVD) technique at 600 degrees C. The effects of hydrogen partial pressure on the growth of MWCNT-graphene-like nanocarbon hybrid films and their structural, morphological and field emission properties were investigated. High resolution scanning electron microscope revealed MWCNT structure. High resolution transmission electron microscope images and Raman spectra revealed graphene-like nanocarbon film. Raman spectra showed 20, G, D and D + G peaks at approximately 2690, 1590,1350 and 2930 cm(-1), respectively. The minimum threshold field for electron emission was found to be 3.6 V/mu m corresponding to 1 mu A/cm(2) current density for the MWCNT-graphene-like nanocarbon hybrid film deposited at 20 Torr pressure whereas the maximum current density of 0.12 mA/cm(2) and field enhancement factor of similar to 3356 was obtained for the sample deposited at 5 Tort pressure. (C) 2015 Elsevier B.V. All rights reserved.