• 文献标题:   Growth of large-sized graphene thin-films by liquid precursor-based chemical vapor deposition under atmospheric pressure
  • 文献类型:   Article
  • 作  者:   DONG XC, WANG P, FANG WJ, SU CY, CHEN YH, LI LJ, HUANG W, CHEN P
  • 作者关键词:  
  • 出版物名称:   CARBON
  • ISSN:   0008-6223
  • 通讯作者地址:   Nanyang Technol Univ
  • 被引频次:   81
  • DOI:   10.1016/j.carbon.2011.04.069
  • 出版年:   2011

▎ 摘  要

Large-sized thin-films composed of single- and few-layered graphene have been synthesized by chemical vapor deposition (CVD) on copper foils under atmospheric pressure using ethanol or pentane as the precursor. Confocal Raman measurements, transmission electron microscopy and scanning tunneling microscopy show that the majority part of the obtained films exhibit hexagonal graphene lattice. Optical microscopy and electrical measurements confirm the continuity of these films. It is also found that the CVD-grown graphene films with ethanol as the precursor exhibit lower defect density, higher electrical conductivity, and higher hall mobility than those grown with pentane as the precursor. This liquid-precursor-based atmospheric pressure CVD synthesis provides a new route for simple, inexpensive and safe growth of graphene thin-films. (C) 2011 Elsevier Ltd. All rights reserved.