• 文献标题:   Vertical conduction mechanism of the epitaxial graphene/n-type 4H-SiC heterojunction at cryogenic temperatures
  • 文献类型:   Article
  • 作  者:   TADJER MJ, ANDERSON TJ, HOBART KD, NYAKITI LO, WHEELER VD, MYERSWARD RL, GASKILL DK, EDDY CR, KUB FJ, CALLE F
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   UPM UCM
  • 被引频次:   11
  • DOI:   10.1063/1.4712621
  • 出版年:   2012

▎ 摘  要

Vertical diodes of epitaxial graphene on n(-) 4H-SiC were investigated. The graphene Raman spectra exhibited a higher intensity in the G-line than the 2D-line, indicative of a few-layer graphene film. Rectifying properties improved at low temperatures as the reverse leakage decreased over six orders of magnitude without freeze-out in either material. Carrier concentration of similar to 10(16) cm(-3) in the SiC remained stable down to 15 K, while accumulation charge decreased and depletion width increased in forward bias. The low barrier height of 0.08 eV and absence of recombination-induced emission indicated majority carrier field emission as the dominant conduction mechanism. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4712621]