• 文献标题:   Crystal orientation effects of sapphire substrate on graphene direct growth by metal catalyst-free low-pressure CVD
  • 文献类型:   Article
  • 作  者:   UEDA Y, YAMADA J, ONO T, MARUYAMA T, NARITSUKA S
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Meijo Univ
  • 被引频次:   2
  • DOI:   10.1063/1.5098806
  • 出版年:   2019

▎ 摘  要

Graphene was directly grown on r-plane (1-102), c-plane (0001), and a-plane (11-20) sapphires by low pressure chemical vapor deposition without the use of a metal catalyst. The growth temperature was systematically changed between 1090 and 1210 degrees C to investigate the effects of the crystal orientation of sapphire on the graphene growth. It was found that the growth rate of graphene on r-plane sapphire was very fast compared to that of the samples grown on other orientations. The surface catalytic effect of r-plane sapphire promotes the smooth and flat growth of single-layer graphene. The surface of the r-plane sapphire was kept smooth even at a high temperature of 1210 degrees C because a quick coverage of graphene protects the surface of the sapphire from thermal decomposition and roughening. Published under license by AIP Publishing.