• 文献标题:   The roughening kinetics of hydrogenated graphene
  • 文献类型:   Article
  • 作  者:   SON S, NUNES JF, SHIN Y, LEE JH, CASIRAGHI C
  • 作者关键词:  
  • 出版物名称:   SCIENTIFIC REPORTS
  • ISSN:   2045-2322
  • 通讯作者地址:   Univ Manchester
  • 被引频次:   0
  • DOI:   10.1038/s41598-018-27026-8
  • 出版年:   2018

▎ 摘  要

The roughness is a common property of all growing surfaces -however, the way the roughness of a growing surface changes with time and space is uniquely related to the underlying growth process, i.e. to how the atoms stick to the surface during the first stage of nucleation. This concept allows getting insights on the nucleation process of a growing surface by measuring two scaling exponents, alpha and beta, known as roughness and growth exponents, respectively. In this work, we studied hydrogenation of graphene using the roughening kinetics. The coverage of graphene will depend on how the H ions stick on the surface, giving rise to a unique roughness evolution in time and space. We measured a roughness exponent of similar to 0.5 (derived from a Fourier index of similar to 3), and a growth exponent of similar to 0.3. The values of the growth and roughness exponents are close to those reported for clustered carbon, suggesting a roughening mechanism by clustering, in good agreement with the theory. We also compared our coverage data with a different model, used to describe the dynamics of graphene coverage, during chemical vapour deposition. Our data are in agreement with a nucleation-dominated growth, further confirming that hydrogenation is happening by clustering.