• 文献标题:   Scattering strength of the scatterer inducing variability in graphene on silicon oxide
  • 文献类型:   Article
  • 作  者:   KATOCH J, LE D, SINGH S, RAO R, RAHMAN TS, ISHIGAMI M
  • 作者关键词:   graphene, 2d material, field effect mobility, silicon oxide substrate
  • 出版物名称:   JOURNAL OF PHYSICSCONDENSED MATTER
  • ISSN:   0953-8984 EI 1361-648X
  • 通讯作者地址:   Univ Cent Florida
  • 被引频次:   2
  • DOI:   10.1088/0953-8984/28/11/115301
  • 出版年:   2016

▎ 摘  要

Large variability of carrier mobility of graphene-based field effect transistors hampers graphene science and technology. We show that the number of the scatterer responsible for the observed variability on graphene devices on silicon oxide can be determined by finding the number of hydrogen that can be chemisorbed on graphene. We use the relationship between the number of the scatterer and the mobility of graphene devices to determine that the variability-inducing scatterer possesses scattering strength 10 times smaller than that of adsorbed potassium atoms and 50 times smaller than that of ion-beam induced vacancies. Our results provide an important, quantitative input towards determining the origin of the variability.