• 文献标题:   Electronic properties of graphene/p-silicon Schottky junction
  • 文献类型:   Article
  • 作  者:   LUONGO G, DI BARTOLOMEO A, GIUBILEO F, CHAVARIN CA, WENGER C
  • 作者关键词:   schottky junction, graphene, ptype silicon, diode, photoresponse, barrier height
  • 出版物名称:   JOURNAL OF PHYSICS DAPPLIED PHYSICS
  • ISSN:   0022-3727 EI 1361-6463
  • 通讯作者地址:   Univ Salerno
  • 被引频次:   10
  • DOI:   10.1088/1361-6463/aac562
  • 出版年:   2018

▎ 摘  要

We fabricate graphene/p-Si heterojunctions and characterize their current-voltage properties in a wide temperature range. The devices exhibit Schottky diode behaviour with a modest rectification factor up to 10(2). The Schottky parameters are estimated in the framework of the thermionic emission theory using Cheung's and Norde's methods. At room temperature, we obtain an ideality factor of about 2.5 and a Schottky barrier height of similar to 0.18 eV, which reduces at lower temperatures. We shed light on the physical mechanisms responsible for the low barrier, discussing the p-doping of graphene caused by the transfer process, the exposure to air and the out-diffusion of boron from the Si substrate. We finally propose a band model that fully explains the experimental current-voltage features, included a plateau observed in reverse current at low temperatures.