• 文献标题:   Density functional calculation of silicon adatom adsorption on pure and defected graphene
  • 文献类型:   Article
  • 作  者:   SHARMA S, VERMA AS
  • 作者关键词:   adsorption, computer modelling simulation, bandstructure, nanostructure
  • 出版物名称:   PHILOSOPHICAL MAGAZINE
  • ISSN:   1478-6435 EI 1478-6443
  • 通讯作者地址:   Panjab Univ
  • 被引频次:   2
  • DOI:   10.1080/14786435.2013.861945
  • 出版年:   2014

▎ 摘  要

We investigate, at a density functional level, the interaction of a single silicon atom with defected and defect-free graphene. Three models of graphene are considered for adsorption, pristine, boron-doped graphene (BG) and Stone-Wales (SW) defected graphene. The relaxed geometry due to the DFT total energy calculation for all systems was investigated. The binding energy corresponding to the most stable configuration of silicon atom on B-doped and SW defected graphene is -2.80 and -2.85 eV respectively, as compared to -1.21 eV for the silicon atom on pure graphene system. The results reveal that the silicon atom bounds to the surface of SW defected graphene and BG more tightly in comparison with the defect-free graphene consequently making the adsorbed systems more stable.