• 文献标题:   Step-edge instability during epitaxial growth of graphene from SiC(0001)
  • 文献类型:   Article
  • 作  者:   BOROVIKOV V, ZANGWILL A
  • 作者关键词:  
  • 出版物名称:   PHYSICAL REVIEW B
  • ISSN:   2469-9950 EI 2469-9969
  • 通讯作者地址:   Georgia Inst Technol
  • 被引频次:   53
  • DOI:   10.1103/PhysRevB.80.121406
  • 出版年:   2009

▎ 摘  要

A continuum equation for step motion is used to explain fingerlike structures observed when graphene is grown epitaxially by step flow decomposition of SiC(0001). A linear stability analysis predicts when a morphological perturbation of a straight moving step grows or decays as a function of growth temperature, the background pressure of Si maintained during growth, and the presence of an inert buffer gas used to retard the escape of Si atoms from the crystal surface. The theory gives semiquantitative agreement with experiment for the characteristic separation between fingers observed when graphene is grown in a low-pressure induction furnace or under ultrahigh vacuum conditions. A local heating mechanism is proposed as the driving force for instability.