• 文献标题:   In-situ fabrication of reduced graphene oxide (rGO)/ZnO heterostructure: surface functional groups induced electrical properties
  • 文献类型:   Article
  • 作  者:   CHEN XY, GUO HC, WANG T, LU M, WANG TH
  • 作者关键词:   reduced graphene oxide, zno, hydroxyl, epoxy, heterostructure
  • 出版物名称:   ELECTROCHIMICA ACTA
  • ISSN:   0013-4686 EI 1873-3859
  • 通讯作者地址:   Xiamen Univ
  • 被引频次:   11
  • DOI:   10.1016/j.electacta.2016.02.201
  • 出版年:   2016

▎ 摘  要

Reduced graphene oxide (rGO)/ZnO heterostructure was prepared via electrochemical deposition directly on Hummers method derived rGO membranes and the corresponding diodes had been fabricated. Rectifying I-V curve was obtained by modifying the functional groups on the surface of rGO. Further investigation for GO based transistors showed that the conductivity of rGO could vary from n-type to p-type under different annealing conditions. Based on Lerf-Klinowski model and X-Ray photoelectron spectroscopy, it was found that the C-sp(2), hydroxyl and epoxy in rGO would be responsible for the change of electrical properties. It was also concluded that reasonable p-type conductivity of rGO for obtaining rectifying rGO/ZnO heterostructure occurred while the percentage of C-sp(2) content was about 54% with the C-sp(2)/(OH+C-O-C) ratio around 1.6. (C) 2016 Elsevier Ltd. All rights reserved.