• 文献标题:   Low-kappa organic layer as a top gate dielectric for graphene field effect transistors
  • 文献类型:   Article
  • 作  者:   MORDI G, JANDHYALA S, FLORESCA C, MCDONNELL S, KIM MJ, WALLACE RM, COLOMBO L, KIM J
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Univ Texas Dallas
  • 被引频次:   15
  • DOI:   10.1063/1.4711776
  • 出版年:   2012

▎ 摘  要

We demonstrate the characteristics of dual gated graphene field effect transistors using a thin layer (similar to 7 nm) of parylene-C as a top-gate dielectric. Our devices exhibit good dielectric properties with minimal doping, low leakage current (similar to 10(-6) A/cm(2) at +/- 2 V), and a dielectric constant of similar to 2.1. Additionally, Raman spectroscopy did not reveal any process induced defects after dielectric deposition. Electrical characterization performed in air showed a carrier mobility of similar to 5050 cm(2)/Vs with hysteresis less than 30 mV during top gate operation (-2.5V to 2.5 V) which indicates that parylene and its interface with graphene does not have a significant amount of trapped charges. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4711776]