• 文献标题:   Suppression of Inhomogeneous Segregation in Graphene Growth on Epitaxial Metal Films
  • 文献类型:   Article
  • 作  者:   YOSHII S, NOZAWA K, TOYODA K, MATSUKAWA N, ODAGAWA A, TSUJIMURA A
  • 作者关键词:   graphene, epitaxy, chemical vapor deposition, ruthenium, nickel, cobalt
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984
  • 通讯作者地址:   Panasonic Corp
  • 被引频次:   38
  • DOI:   10.1021/nl200604g
  • 出版年:   2011

▎ 摘  要

Large-scale uniform graphene growth was achieved by suppressing inhomogeneous carbon segregation using a single domain Ru film epitaxially grown on a sapphire substrate. An investigation of how the metal thickness affected growth and a comparative study on metals with different crystal structures have revealed that locally enhanced carbon segregation at stacking domain boundaries of metal is the origin of inhomogeneous graphene growth. Single domain Ru film has no stacking domain boundary, and the graphene growth on it is mainly caused not by segregation but by a surface catalytic reaction. Suppression of local segregation is essential for uniform graphene growth on epitaxial metal films.