• 文献标题:   Effect of Cu substrate roughness on growth of graphene domains at atmospheric pressure
  • 文献类型:   Article
  • 作  者:   WANG B, ZHANG HR, ZHANG YH, CHEN ZY, JIN Z, LIU XY, HU LZ, YU GH
  • 作者关键词:   graphene, chemical vapor deposition, sem, defect
  • 出版物名称:   MATERIALS LETTERS
  • ISSN:   0167-577X EI 1873-4979
  • 通讯作者地址:   Chinese Acad Sci
  • 被引频次:   13
  • DOI:   10.1016/j.matlet.2014.05.155
  • 出版年:   2014

▎ 摘  要

In this paper, the morphologies of copper surface such as roughness and grain boundary were found to have crucial roles in the formation of nucleation seeds of graphene domains. We reduced the number density of graphene domains via polishing the Cu substrate in a chemical mechanical method. Scanning electron microscope and optical microscope images showed that it was preferential to form nucleation seeds along the Cu grain boundary and scratched area of the polished Cu substrate. We demonstrated that a very flat surface morphology of Cu substrate was beneficial for growing hexagonal single-crystal graphene domain which could enhance the homogeneity and electronic transport properties of graphene films. (C) 2014 Elsevier B.V. All rights reserved.