• 文献标题:   Determination of non-uniform graphene thickness on SiC (0001) by X-ray diffraction
  • 文献类型:   Article
  • 作  者:   RUAMMAITREE A, NAKAHARA H, AKIMOTO K, SODA K, SAITO Y
  • 作者关键词:   sic, epitaxial graphene, xray diffraction, angleresolved photoemission spectroscopy
  • 出版物名称:   APPLIED SURFACE SCIENCE
  • ISSN:   0169-4332 EI 1873-5584
  • 通讯作者地址:   Nagoya Univ
  • 被引频次:   19
  • DOI:   10.1016/j.apsusc.2013.05.122
  • 出版年:   2013

▎ 摘  要

Epitaxial graphene thickness distribution grown on Si-terminated SiC (0 0 0 1) surface was analyzed by using an X-ray diffraction (XRD) pattern and a simple equation. These results were confirmed by low accelerating voltage scanning electron microscopy and angle resolved photoemission spectroscopy. Despite its simplicity, proposed XRD analysis provides fairly accurate information on layer spacing and thickness distribution of graphene layers. It is expected that this method is useful for quick evaluation of graphene layer numbers on large scale substrate. (C) 2013 Elsevier B. V. All rights reserved.