• 文献标题:   Extreme.Ultraviolet Generation-of Localized Defects-in Single-Layer Graphene: Raman Mapping, Atomic Force Microscopy, and High Resolution Scanning EleCtron Microscopy' Analysis
  • 文献类型:   Article
  • 作  者:   BOTTI S, MEZI L, RUFOLONI A, VANNOZZI A, BOLLANTI S, FLORA F
  • 作者关键词:   graphene, graphene defect, raman spectroscopy, euv radiation, localized defect formation in graphene
  • 出版物名称:   ACS APPLIED ELECTRONIC MATERIALS
  • ISSN:   2637-6113
  • 通讯作者地址:   ENEA
  • 被引频次:   2
  • DOI:   10.1021/acsaelm.9b00566
  • 出版年:   2019

▎ 摘  要

We report micro -Raman spectroscopy, high -resolution scanning electron microscopy (HR-SEM) and atomic force microscopy (AFM) investigation of changes in chemical vapor deposition grown single -layer graphene structure induced by extreme ultraviolet (EUV) irradiation. We found that the exposures at doses up to 200 mJ/cm2 result in the appearance of D and D' bands related to defects in the graphene lattice. The evolution of D and G band intensity ratio follows the first stage of amorphization trajectory, which indicates transformation of pristine graphene to nanocrystalline form. Raman mapping demonstrated that the defects are localized only within the EUV irradiated areas with a density controlled by the EUV dose.