• 文献标题:   Low-energy electron microscopy of graphene outside UHV: electron-induced removal of PMMA residues used for graphene transfer
  • 文献类型:   Article
  • 作  者:   MIKMEKOVA EM, MULLEROVA I, FRANK L, PATAK A, POLCAK J, SLUYTERMAN S, LEJEUNE M, KONVALINA I
  • 作者关键词:   graphene, pmma, slow electron treatment, xps, raman spectroscopy
  • 出版物名称:   JOURNAL OF ELECTRON SPECTROSCOPY RELATED PHENOMENA
  • ISSN:   0368-2048 EI 1873-2526
  • 通讯作者地址:   Czech Acad Sci
  • 被引频次:   1
  • DOI:   10.1016/j.elspec.2019.06.005
  • 出版年:   2020

▎ 摘  要

Two-dimensional materials, such as graphene, are usually prepared by chemical vapor deposition (CVD) on selected substrates, and their transfer is completed with a supporting layer, mostly polymethyl methacrylate (PMMA). Indeed, the PMMA has to be removed precisely to obtain the predicted superior properties of graphene after the transfer process. We demonstrate a new and effective technique to achieve a polymer-free CVD graphene - by utilizing low-energy electron irradiation in a scanning low-energy electron microscope (SLEEM). The influence of electron-landing energy on cleaning efficiency and graphene quality was observed by SLEEM, Raman spectroscopy (the presence of disorder D peak) and XPS (the deconvolution of the C 1s peak). After removing the absorbed molecules and polymer residues from the graphene surface with slow electrons, the individual graphene layers can also be distinguished outside ultra-high vacuum conditions in both the reflected and transmitted modes of a scanning low-energy (transmission) electron microscope.