▎ 摘　　要

Novel design of omniphobic membrane could relieve the wetting phenomenon caused by low surface energy contaminants in the feed of membrane distillation process. In this work, we reported on a new kind of omni-phobic graphene oxide (GO) membrane fabricated by plasma treatment and subsequent fluoroalkyl grafting of stacked GO laminates. The plasma treatment not only created in-plane nanopores in GO nanosheets to provide more water channels, but also added active sites for fluoroalkyl grafting to build a robust omniphobic membrane surface. The resulting omniphobic membrane exhibited outperformed water flux of similar to 35 kg m-2 h(-1) and salt rejection of 99.9% for 35 g L-1 NaCl solution with 0.2-0.4 mM sodium dodecyl sulfate (SDS) at 60 degrees C during over 450 h of direct contact membrane distillation (DCMD) process. This work provides a facile strategy to develop high-flux and wetting-resistance materials for membrane distillation.