• 文献标题:   Control of Graphene Etching by Atomic Structures of the Supporting Substrate Surfaces
  • 文献类型:   Article
  • 作  者:   TSUKAMOTO T, OGINO T
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF PHYSICAL CHEMISTRY C
  • ISSN:   1932-7447 EI 1932-7455
  • 通讯作者地址:   Yokohama Natl Univ
  • 被引频次:   27
  • DOI:   10.1021/jp1094933
  • 出版年:   2011

▎ 摘  要

We attached single-layer graphene or few-layer graphene (FLG) on a sapphire (1-102) surface with well-ordered step/terrace structures and then etched them using catalytic nanoparticles. In the etching of FLG flakes, atomic steps can be utilized as guides or reflectors. In the case of single-layer graphene, the etching proceeds in a particular direction of a surface phase pattern on the terrace, and graphene nanoribbons are self-formed. The surface structures of the supporting substrate are good templates for graphene processing.