• 文献标题:   Deposition of topological silicene, germanene and stanene on graphene-covered SiC substrates
  • 文献类型:   Article
  • 作  者:   MATUSALEM F, KODA DS, BECHSTEDT F, MARQUES M, TELES LK
  • 作者关键词:  
  • 出版物名称:   SCIENTIFIC REPORTS
  • ISSN:   2045-2322
  • 通讯作者地址:   ITA
  • 被引频次:   12
  • DOI:   10.1038/s41598-017-15610-3
  • 出版年:   2017

▎ 摘  要

Growth of X-enes, such as silicene, germanene and stanene, requires passivated substrates to ensure the survival of their exotic properties. Using first-principles methods, we study as-grown graphene on polar SiC surfaces as suitable substrates. Trilayer combinations with coincidence lattices with large hexagonal unit cells allow for strain-free group-IV monolayers. In contrast to the Si-terminated SiC surface, van der Waals-bonded honeycomb X-ene/graphene bilayers on top of the C-terminated SiC substrate are stable. Folded band structures show Dirac cones of the overlayers with small gaps of about 0.1 eV in between. The topological invariants of the peeled-off X-ene/graphene bilayers indicate the presence of topological character and the existence of a quantum spin Hall phase.