• 文献标题:   Microscopic Raman Mapping of Epitaxial Graphene on 4H-SiC(0001)
  • 文献类型:   Article
  • 作  者:   RYONGSOK O, IWAMOTO A, NISHI Y, FUNASE Y, YUASA T, TOMITA T, NAGASE M, HIBINO H, YAMAGUCHI H
  • 作者关键词:  
  • 出版物名称:   JAPANESE JOURNAL OF APPLIED PHYSICS
  • ISSN:   0021-4922 EI 1347-4065
  • 通讯作者地址:   Univ Tokushima
  • 被引频次:   9
  • DOI:   10.1143/JJAP.51.06FD06
  • 出版年:   2012

▎ 摘  要

We propose a quality control method for wafer-scale epitaxial graphene grown on SiC substrates. The peak position of Raman spectra of epitaxial graphene is an excellent indicator of film quality and reveals irregularities, such as graphene thickness inhomogeneity and SiC substrate defects. A comparison of microscopic Raman maps and scanning probe microscopy images of the same position of the sample revealed that wave numbers of Raman peaks (G and 2D band peaks) were strongly correlated with the strain in the graphene film. The increase in number of graphene layers (2 to 3-4 layers) induced phonon softening (similar to 6 cm(-1)) and broadening (similar to 6 cm(-1)) of the 2D band peak. Significant phonon softening and abnormal broadening of the Raman peaks were observed at residual scratches on the SiC substrate. The quantitative layer number distribution of graphene on SiC is successfully estimated from the wave number distribution of the 2D band peak. (C) 2012 The Japan Society of Applied Physics