▎ 摘　　要

We have reported a simple, scalable and solution processed graphene patterning method using electron beam lithography followed by a lift-off process. This method is free from etching process and can be used for fabrication of graphene based patterns for nanodevices application. This process is universal to arbitrary substrates and can be employed for large scale pattern fabrication especially for graphene array based nanodevice applications. Using this method various types of graphene patterns like rectangular lines (100 mu m x 10 mu m) connecting with square pads (50 mu m x 50 mu m) and hall probe patterns were created over oxidized silicon substrates.