• 文献标题:   Intrinsic and extrinsic corrugation of monolayer graphene deposited on SiO2
  • 文献类型:   Article
  • 作  者:   GERINGER V, LIEBMANN M, ECHTERMEYER T, RUNTE S, SCHMIDT M, RUCKAMP R, LEMME MC, MORGENSTERN M
  • 作者关键词:  
  • 出版物名称:   PHYSICAL REVIEW LETTERS
  • ISSN:   0031-9007
  • 通讯作者地址:   Univ Aachen
  • 被引频次:   253
  • DOI:   10.1103/PhysRevLett.102.076102
  • 出版年:   2009

▎ 摘  要

Using scanning tunneling microscopy in an ultrahigh vacuum and atomic force microscopy, we investigate the corrugation of graphene flakes deposited by exfoliation on a Si/SiO2 (300 nm) surface. While the corrugation on SiO2 is long range with a correlation length of about 25 nm, some of the graphene monolayers exhibit an additional corrugation with a preferential wavelength of about 15 nm. A detailed analysis shows that the long-range corrugation of the substrate is also visible on graphene, but with a reduced amplitude, leading to the conclusion that the graphene is partly freely suspended between hills of the substrate. Thus, the intrinsic rippling observed previously on artificially suspended graphene can exist as well, if graphene is deposited on SiO2.