• 文献标题:   Atomically resolved electronic properties in single layer graphene on alpha-Al2O3 (0001) by chemical vapor deposition
  • 文献类型:   Article
  • 作  者:   WORDENWEBER H, KARTHAUSER S, GRUNDMANN A, WANG ZD, AUSSEN S, KALISCH H, VESCAN A, HEUKEN M, WASER R, HOFFMANNEIFERT S
  • 作者关键词:  
  • 出版物名称:   SCIENTIFIC REPORTS
  • ISSN:   2045-2322
  • 通讯作者地址:  
  • 被引频次:   2
  • DOI:   10.1038/s41598-022-22889-4
  • 出版年:   2022

▎ 摘  要

Metal-free chemical vapor deposition (CVD) of single-layer graphene (SLG) on c-plane sapphire has recently been demonstrated for wafer diameters of up to 300 mm, and the high quality of the SLG layers is generally characterized by integral methods. By applying a comprehensive analysis approach, distinct interactions at the graphene-sapphire interface and local variations caused by the substrate topography are revealed. Regions near the sapphire step edges show tiny wrinkles with a height of about 0.2 nm, framed by delaminated graphene as identified by the typical Dirac cone of free graphene. In contrast, adsorption of CVD SLG on the hydroxyl-terminated alpha-Al2O3 (0001) terraces results in a superstructure with a periodicity of (2.66 +/- 0.03) nm. Weak hydrogen bonds formed between the hydroxylated sapphire surface and the pi-electron system of SLG result in a clean interface. The charge injection induces a band gap in the adsorbed graphene layer of about (73 +/- 3) meV at the Dirac point. The good agreement with the predictions of a theoretical analysis underlines the potential of this hybrid system for emerging electronic applications.