• 文献标题:   Evolution in surface morphology of epitaxial graphene layers on SiC induced by controlled structural strain
  • 文献类型:   Article
  • 作  者:   FERRALIS N, KAWASAKI J, MABOUDIAN R, CARRARO C
  • 作者关键词:   annealing, carbon, compressive strength, epitaxial layer, internal stresse, nanostructured material, surface morphology
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   Univ Calif Berkeley
  • 被引频次:   19
  • DOI:   10.1063/1.3028091
  • 出版年:   2008

▎ 摘  要

The evolution in the surface morphology of epitaxial graphene films and 6H-SiC(0001) substrates is studied by electron channeling contrast imaging. Whereas film thickness is determined by growth temperature only, increasing growth times at constant temperature affects both internal stress and film morphology. Annealing times in excess of 8-10 min lead to an increase in the mean square roughness of SiC step edges to which graphene films are pinned, resulting in compressively stressed films at room temperature. Shorter annealing times produce minimal changes in the morphology of the terrace edges and result in nearly stress-free films upon cooling to room temperature.