• 文献标题:   Controlled doping of graphene using ultraviolet irradiation
  • 文献类型:   Article
  • 作  者:   LUO ZT, PINTO NJ, DAVILA Y, JOHNSON ATC
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Univ Penn
  • 被引频次:   64
  • DOI:   10.1063/1.4729828
  • 出版年:   2012

▎ 摘  要

The electronic properties of graphene are tunable via doping, making it attractive in low dimensional organic electronics. Common methods of doping graphene, however, adversely affect charge mobility and degrade device performance. We demonstrate a facile shadow mask technique of defining electrodes on graphene grown by chemical vapor deposition (CVD) thereby eliminating the use of detrimental chemicals needed in the corresponding lithographic process. Further, we report on the controlled, effective, and reversible doping of graphene via ultraviolet (UV) irradiation with minimal impact on charge mobility. The change in charge concentration saturates at similar to 2 X 10(12) cm(-2) and the quantum yield is similar to 10(-5) e/photon upon initial UV exposure. This simple and controlled strategy opens the possibility of doping wafer-size CVD graphene for diverse applications. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4729828]