• 文献标题:   Uniaxial Strain Redistribution in Corrugated Graphene: Clamping, Sliding, Friction, and 2D Band Splitting
  • 文献类型:   Article
  • 作  者:   WANG XY, TANTIWANICHAPAN K, CHRISTOPHER JW, PAIELLA R, SWAN AK
  • 作者关键词:   graphene, strain engineering, friction, corrugated surface, raman spectroscopy, 2d mode gruneisen parameter
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Boston Univ
  • 被引频次:   14
  • DOI:   10.1021/acs.nanolett.5b02107
  • 出版年:   2015

▎ 摘  要

Graphene is a promising material for strain engineering based on its excellent flexibility and elastic properties, coupled with very high electrical mobility. In order to implement strain devices, it is important to understand and control the clamping of graphene to its support. Here, we investigate the limits of the strong van der Waals interaction on friction clamping. We find that the friction of graphene on a SiO2 substrate can support a maximum local strain gradient and that higher strain gradients result in sliding and strain redistribution. Furthermore, the friction decreases with increasing strain. The system used is graphene placed over a nanoscale SiO2 grating, causing strain and local strain variations. We use a combination of atomic force microscopy and Raman scattering to determine the friction coefficient, after accounting for compression and accidental charge doping, and model the local strain variation within the laser spot size. By using uniaxial strain aligned to a high crystal symmetry direction, we also determine the 2D Raman Gruneisen parameter and deformation potential in the zigzag direction.