• 文献标题:   Control of graphene surface wettability by using CF4 plasma
  • 文献类型:   Article
  • 作  者:   LIM T, JU S
  • 作者关键词:   graphene, wettability, plasma, hydrophobicity, fluorine
  • 出版物名称:   SURFACE COATINGS TECHNOLOGY
  • ISSN:   0257-8972
  • 通讯作者地址:   Kyonggi Univ
  • 被引频次:   7
  • DOI:   10.1016/j.surfcoat.2017.08.044
  • 出版年:   2017

▎ 摘  要

In this work, graphene was treated by tetrafluoromethane (CF4) plasma to investigate the effect on its wettability. Fluorine was adsorbed on the graphene surface after the plasma treatment, and the contact angle of the fluorinefunctionalized graphene increased to similar to 104.9 degrees from similar to 66.7 degrees for pristine graphene. The durability of the fluorinefunctionalized graphene samples was tested as a function of time, and the samples were found to have stable hydrophobic properties, which suggests that a robust chemical bond was formed between fluorine and the graphene surface. Our results demonstrate that the use of plasma techniques to control the wetting characteristics of graphene is a low-cost and highly reliable method that is well suited for the fabrication of low-friction materials for various applications. (C) 2017 Elsevier By. All rights reserved.