• 文献标题:   Impact of Interconnect Spacing on Crosstalk for Multi-layered Graphene Nanoribbon
  • 文献类型:   Article, Early Access
  • 作  者:   KUMBHARE VR, PALTANI PP, MAJUMDER MK
  • 作者关键词:   crosstalk induced delay, equivalent singleconductor esc, multiconductor transmission line mtl, multilayer graphene nanoribbon mlgnr, peak noise
  • 出版物名称:   IETE JOURNAL OF RESEARCH
  • ISSN:   0377-2063 EI 0974-780X
  • 通讯作者地址:   Dr Shyama Prasad Mukherjee Int Inst Informat Tech
  • 被引频次:   2
  • DOI:   10.1080/03772063.2019.1637788 EA JUL 2019
  • 出版年:  

▎ 摘  要

In the recent research world, the overall system performance primarily depends on interconnect delay instead of the gate delay at the nanoscale regime. The impact of spacing between the lines and shrinking technology are rigorously investigated on peak noise and delay under the crosstalk for rough-edged multi-layered graphene nanoribbon (MLGNR) at global lengths. Using a rough-edged MLGNR, a multi-conductor transmission line (MTL) model is accurately demonstrated by considering the effect of coupling capacitance and inter-layer tunnelling conductance. By incorporating lengths and spacing between the coupled MLGNR interconnect, the equivalent electrical model exhibits an insignificant error of 0.91% only. Moreover, the proposed equivalent model is used to demonstrate the delay under the influence of crosstalk and peak noise for coupled interconnect lines. Using industry standard HSPICE, the overall delay and peak noise under the crosstalk are reduced by 45.1% and 9%, respectively at advanced 14 nm technology in comparison to the 32 nm for a fixed layer of rough-edged MLGNR based global VLSI interconnects.