• 文献标题:   Effect of energy band gap in graphene on negative refraction through the veselago lens and electron conductance
  • 文献类型:   Article
  • 作  者:   DAHAL D, GUMBS G
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF PHYSICS CHEMISTRY OF SOLIDS
  • ISSN:   0022-3697 EI 1879-2553
  • 通讯作者地址:   CUNY Hunter Coll
  • 被引频次:   5
  • DOI:   10.1016/j.jpcs.2016.08.014
  • 出版年:   2017

▎ 摘  要

A remarkable property of intrinsic graphene is that upon doping, electrons and holes travel through the monolayer thick material with constant velocity which does not depend on energy up to about 0.3 eV (Dirac fermions), as though the electrons and holes are massless particles and antiparticles which move at the Fermi velocity v(F). Consequently, there is Klein tunneling at a p-n junction, in which there is no backscattering at normal incidence of massless Dirac fermions. However, this process yielding perfect transmission at normal incidence is expected to be affected when the group velocity of the charge carriers is energy dependent and there is non-zero effective mass for the target particle. We investigate how away from normal incidence the combined effect of incident electron energy epsilon and band gap parameter Delta can determine whether a p-n junction would allow focusing of an electron beam by behaving like a Veselago lens with negative refractive index. We demonstrate that there is a specific region in epsilon - Delta space where the index of refraction is negative, i.e., where monolayer graphene behaves as a metamaterial. Outside this region, the refractive index may be positive or there may be no refraction at all. We compute the ballistic conductance across a p-n junction as a function of 4 and e and compare our results with those for a single electrostatic potential barrier and multiple barriers. (C) 2016 Elsevier Ltd. All rights reserved.