• 文献标题:   Defect-enhanced coupling between graphene and SiO2 substrate
  • 文献类型:   Article
  • 作  者:   WU S, YANG R, CHENG M, YANG W, XIE GB, CHEN P, SHI DX, ZHANG GY
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Chinese Acad Sci
  • 被引频次:   5
  • DOI:   10.1063/1.4892959
  • 出版年:   2014

▎ 摘  要

Identifying the role of defects that limits graphene's quality is important for various graphene devices on SiO2. In this paper, monolayer graphene samples with defect densities varying from similar to 0.04 mu m(-2) to similar to 10 mu m(-2) on SiO2 are characterized by both microscopic imaging and electrical transport measurements. We found that the height of graphene on SiO2 is directly related to its defect densities with a reverse correlation, which in turn degrade graphene's quality through a complicated mechanism rather than defects scattering only. We suggest that, at relative high defect density regime, graphene-SiO2 coupling is greatly enhanced causing an increasing charged impurity scattering significantly. (C) 2014 AIP Publishing LLC.