▎ 摘　　要

The deposition of copper atoms on the graphene surface was studied using the molecular dynamic model. The film was formed from a layer of copper atoms that occupied nonadjacent hexagonal cells in the structure of graphene and the deposited "cloud" of randomly arranged Cu atoms. The metal film on graphene expanded toward the "chair" conformation during the film formation. The mobility of Cu atoms in directions parallel to the plane of the graphene sheet gradually decreased as the film became more consolidated, while the mobility of Cu atoms in the direction perpendicular to this plane decreased very nonuniformly. The film formation was accompanied by relaxation of stresses in the metal plane parallel to the graphene sheet. The relaxation occurred at first via the fast phase and then via the slow one. The deposited copper film in general has an insignificant effect on the mechanical properties of graphene, as indicated by the distribution of stresses that act in the plane of the graphene sheet. In the course of film formation, its radial distribution function undergoes considerable changes.