• 文献标题:   High performance MoS2 TFT using graphene contact first process
  • 文献类型:   Article
  • 作  者:   CHIEN CSC, CHANG HM, LEE WT, TANG MR, WU CH, LEE SC
  • 作者关键词:  
  • 出版物名称:   AIP ADVANCES
  • ISSN:   2158-3226
  • 通讯作者地址:   Natl Taiwan Univ
  • 被引频次:   1
  • DOI:   10.1063/1.4996136
  • 出版年:   2017

▎ 摘  要

An ohmic contact of graphene/MoS2 heterostructure is determined by using ultraviolet photoelectron spectroscopy (UPS). Since graphene shows a great potential to replace metal contact, a direct comparison of Cr/Au contact and graphene contact on the MoS2 thin film transistor (TFT) is made. Different from metal contacts, the work function of graphene can be modulated. As a result, the subthreshold swing can be improved. And when V-g < V-FB, the intrinsic graphene changes into p-type, so graphene contact can achieve lower off current by lowering the Fermi level. To further improve the performance of MoS2 TFT, a new method using graphene contact first and MoS2 layer last process that can avoid PMMA residue and high processing temperature is applied. MoS2 TFT using this method shows on/off current ratio up to 6x10(6) order of magnitude, high mobility of 116 cm(2)/V-sec, and subthreshold swing of only 0.515 V/dec. (C) 2017 Author(s).