• 文献标题:   N-Doped Graphene Field-Effect Transistors with Enhanced Electron Mobility and Air-Stability
  • 文献类型:   Article
  • 作  者:   XU W, LIM TS, SEO HK, MIN SY, CHO H, PARK MH, KIM YH, LEE TW
  • 作者关键词:   ntype doping, graphene fieldeffect transistor, carrier mobility, dirac point
  • 出版物名称:   SMALL
  • ISSN:   1613-6810 EI 1613-6829
  • 通讯作者地址:   Pohang Univ Sci Technol POSTECH
  • 被引频次:   50
  • DOI:   10.1002/smll.201303768
  • 出版年:   2014

▎ 摘  要

Although graphene can be easily p-doped by various adsorbates, developing stable n-doped graphene that is very useful for practical device applications is a difficult challenge. We investigated the doping effect of solution-processed (4-(1,3-dimethyl-2,3-dihydro-1H-benzoimidazol-2-yl)phenyl)dimethylamine (N-DMBI) on chemical-vapor-deposited (CVD) graphene. Strong n-type doping is confirmed by Raman spectroscopy and the electrical transport characteristics of graphene field-effect transistors. The strong n-type doping effect shifts the Dirac point to around -140 V. Appropriate annealing at a low temperature of 80 oC enables an enhanced electron mobility of 1150 cm(2) V-1 s(-1). The work function and its uniformity on a large scale (1.2 mm x 1.2 mm) of the doped surface are evaluated using ultraviolet photoelectron spectroscopy and Kelvin probe mapping. Stable electrical properties are observed in a device aged in air for more than one month.