• 文献标题:   Graphene-based deep-ultraviolet photodetectors with ultrahigh responsivity using chemical vapor deposition of hexagonal boron nitride to achieve photogating
  • 文献类型:   Article
  • 作  者:   FUKUSHIMA S, FUKAMACHI S, SHIMATANI M, KAWAHARA K, AGO H, OGAWA S
  • 作者关键词:  
  • 出版物名称:   OPTICAL MATERIALS EXPRESS
  • ISSN:   2159-3930
  • 通讯作者地址:  
  • 被引频次:   4
  • DOI:   10.1364/OME.457545
  • 出版年:   2022

▎ 摘  要

This study presents high-responsivity graphene-based deep-ultraviolet (DUV) photodetectors using chemical vapor deposition (CVD)-hexagonal boron nitride (h-BN) photogating. To improve the DUV photoresponse, h-BN was used as a photosensitizer in graphene field-effect transistors (GFETs). The h-BN photosensitizers were synthesized using CVD and then transferred onto a SiO2/Si substrate. The behavior of h-BN irradiated with DUV light was investigated using cathodoluminescence and UV-VIS reflectance. Under 260 nm light, it exhibited a clear photoresponse with an ultrahigh responsivity of 19600 AW(-1), which was 460% higher than a GFET device without h-BN photosensitizers. A noise equivalent power of 3.09x10(-1)3 W/Hz(1/2) was achieved. (C) 2022 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement