▎ 摘　　要

An intercalation process for narrow graphene interconnects with linewidths of <100nm was investigated for interconnect applications. Typical intercalation conditions for graphene flakes of >5 mu m size induced partial delamination of the graphene layers and insufficient intercalation in some graphene interconnects with linewidths of <500 nm. More moderate intercalation conditions such as lower temperature suppressed the delamination of the graphene layers and provided improved doping characteristics with a higher yield in narrow graphene interconnects with linewidths of <100 nm. The intercalation of MoCl5 into narrow graphene interconnects under suitable conditions was confirmed by Raman scattering spectroscopy. These results indicate that intercalation using MoCl5 is promising for the fabrication of narrow graphene interconnects. (C) 2017 The Japan Society of Applied Physics