• 文献标题:   Influence of contact doping on graphene nanoribbon heterojunction tunneling field effect transistors
  • 文献类型:   Article, Proceedings Paper
  • 作  者:   DA HX, LAM KT, SAMUDRA GS, LIANG GC, CHIN SK
  • 作者关键词:   graphene nanoribbon, tunneling fieldeffect transistor, heterojunction, doping concentration, device performance
  • 出版物名称:   SOLIDSTATE ELECTRONICS
  • ISSN:   0038-1101 EI 1879-2405
  • 通讯作者地址:   Natl Univ Singapore
  • 被引频次:   5
  • DOI:   10.1016/j.sse.2012.05.023
  • 出版年:   2012

▎ 摘  要

We investigated the device performance of graphene nanoribbon tunneling field-effect transistors with heterogeneous channel as a function of the contact doping concentrations. The simulations were carried out based on the non-equilibrium Green's function, coupled with a Dirac Hamiltonian model, and the roles of symmetric and asymmetric contact doping concentrations on the device performance were identified. It was observed that the device performances such as OFF-state currents (I-OFF). ON-state currents (I-ON) and subthreshold slopes (SSs) were greatly influenced by the source doping concentrations, while variations in drain doping concentrations changed mainly the I-OFF. By applying proper asymmetric source and drain doping concentrations, low SS and large I-ON/I-OFF ratio can be achieved, indicating that it is an alternative route to effectively enhance the device performance. (c) 2012 Elsevier Ltd. All rights reserved.