• 文献标题:   Nanolithography and manipulation of graphene using an atomic force microscope
  • 文献类型:   Article
  • 作  者:   GIESBERS AJM, ZEITLER U, NEUBECK S, FREITAG F, NOVOSELOV KS, MAAN JC
  • 作者关键词:   graphene, nanolithography, atomic force microscopy
  • 出版物名称:   SOLID STATE COMMUNICATIONS
  • ISSN:   0038-1098
  • 通讯作者地址:   Radboud Univ Nijmegen
  • 被引频次:   116
  • DOI:   10.1016/j.ssc.2008.06.027
  • 出版年:   2008

▎ 摘  要

We use an atomic force microscope (AFM) to manipulate graphene films on a nanoscopic length scale. By means of local anodic oxidation with an AFM we are able to structure isolating trenches into single-layer and few-layer graphene flakes, opening the possibility of tabletop graphene based device fabrication. Trench sizes of less than 30 nm in width are attainable with this technique. Besides oxidation we also show the influence of mechanical peeling and scratching with an AFM of few layer graphene sheets placed on different substrates. (c) 2008 Elsevier Ltd. All rights reserved.