• 文献标题:   Effect of intermittent oxygen exposure on chemical vapor deposition of graphene
  • 文献类型:   Article
  • 作  者:   TEMIZ S, MUTLU Z, SHAHREZAEI S, OZKAN M, OZKAN CS
  • 作者关键词:  
  • 出版物名称:   MRS COMMUNICATIONS
  • ISSN:   2159-6859 EI 2159-6867
  • 通讯作者地址:   Univ Calif Riverside
  • 被引频次:   4
  • DOI:   10.1557/mrc.2017.111
  • 出版年:   2017

▎ 摘  要

Chemical vapor deposition is the most proficient method for growing graphene on copper foils due to its scalability, repeatability, and uniformity, etc. Herein, we systematically study the effect of oxygen (O-2) exposure on graphene growth. We introduced O-2 before and during the growth, and then studied its effects on the morphology, crystallinity, and nucleation density of graphene. We observe that introducing O-2 during growth significantly improves the graphene crystallinity while pre-dosing O-2 before growth reduces the graphene nucleation density. These studies suggest that intermittent O-2 exposure play a significant role in graphene growth, enabling scalable production of high-quality graphene.