• 文献标题:   Top-gate dielectric induced doping and scattering of charge carriers in epitaxial graphene
  • 文献类型:   Article
  • 作  者:   PULS CP, STALEY NE, MOON JS, ROBINSON JA, CAMPBELL PM, TEDESCO JL, MYERSWARD RL, EDDY CR, GASKILL DK, LIU Y
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   Penn State Univ
  • 被引频次:   4
  • DOI:   10.1063/1.3607284
  • 出版年:   2011

▎ 摘  要

We show that an e-gun deposited dielectric impose severe limits on epitaxial graphene-based device performance based on Raman spectroscopy and low-temperature transport measurements. Specifically, we show from studies of epitaxial graphene Hall bars covered by SiO(2) that the measured carrier density is strongly inhomogenous and predominantly induced by charged impurities at the grapheme/dielectric interface that limit mobility via Coulomb interactions. Our work emphasizes that material integration of epitaxial graphene and a gate dielectric is the next major road block towards the realization of graphene-based electronics. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3607284]