• 文献标题:   Contact resistance at graphene/MoS2 lateral heterostructures
  • 文献类型:   Article
  • 作  者:   HOUSSA M, IORDANIDOU K, DABRAL A, LU A, MENG R, POURTOIS G, AFANAS EV VV, STESMANS A
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Univ Leuven
  • 被引频次:   4
  • DOI:   10.1063/1.5083133
  • 出版年:   2019

▎ 摘  要

The contact resistance at two-dimensional graphene/MoS2 lateral heterojunctions is theoretically studied, using first-principles simulations based on density functional theory and the nonequilibrium Green's function method. The computed contact resistance lies in the range of 10(2) to 10(4) Omega mu m, depending on the contact edge symmetry (armchair or zigzag) and termination (Mo and/or S terminated). This large variation in the contact resistance arises from the variation in the interface barrier height, which is sensitive to the presence of polar C-Mo bonds or sulfur dangling bonds at the interface. These results highlight that the control of the edge symmetry and/or edge termination is crucial to achieve a low contact resistance (in the range of a few hundred ohms micrometer) at graphene/MoS2 lateral heterojunctions for 2D material-based field-effect devices. Published under license by AIP Publishing.