• 文献标题:   Heterostructure Device Based on Graphene Oxide/TiO2/n-Si for Optoelectronic Applications
  • 文献类型:   Article
  • 作  者:   ASHERY A, GAD SA, SHABAN H, GABALLAH AEH
  • 作者关键词:   silicon, optoelectronic, electronic interface
  • 出版物名称:   ECS JOURNAL OF SOLID STATE SCIENCE TECHNOLOGY
  • ISSN:   2162-8769 EI 2162-8777
  • 通讯作者地址:  
  • 被引频次:   18
  • DOI:   10.1149/2162-8777/abe1d9
  • 出版年:   2021

▎ 摘  要

We produced a graphene oxide with good conductivity by a novel method that saves cost and time as illustrated in the structure Au/GO/TiO2/Si/Al. The GO was synthesized by burning polyvinyl alcohol at 300 degrees C on the TiO2/n-Si surface producing a conductive graphene oxide that is considered a new advantage of this technique. The Au/GO/TiO2/n-Si/Al structure is manufactured using the spin coating process. The XRD and SEM identified the samples' structure and surface topography. In a frequency range from 10 kHz to 20 MHz, the electrical and dielectric parameters of the synthetic Schottky diodes were obtained from capacitance/conductance-voltage. The diagram of real and imaginary parts of the impedance (Z ', Z ''), col-col, and their variation with temperatures, voltage, and frequency were also discussed. A comparison of electrical parameters such as ideality factor (n), series resistance (R-s), barrier height (phi(b)) based on traditional, Cheung, and Norde methods was investigated. The oxide layer thickness values (d(ox)), the density distribution (N-ss), the maximum admittance (Y-m), the maximum electric field (E-m), the depletion layer width (W-d), and Delta phi(b) (eV) were investigated using the C-2 - V relationship. As the frequency increases, the phi(b(C-V)) increases, while the concentration of donor atoms (N-D) decreases. The surface states (N-ss) voltage-dependent profile was calculated and evaluated.